A kinetic model for photochemical vapor deposition from germane and silane

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Abstract

A kinetic model based on the collision theory of chemical reactions is proposed for laser-induced photochemical vapor deposition from germane and silane. Photochemical deposition is composed of two processes: extrinsic photochemical deposition fromphoto-excited molecules and intrinsic thermal deposition from normal reactant molecules. The growth rates of both photochemical deposition and thermal deposition are derived by means of statistical physics. Photochemical deposition dominates at low temperatures, and thermal deposition becomes prominent as the temperature rises. The transition temperature from photochemical deposition to thermal deposition is obtained as a function of fraction of photo-excited molecules and activation energies of photochemical deposition and thermal deposition. Finally, the model is extended to lamp-induced photochemical vapor deposition from silane.

Original languageEnglish (US)
Pages (from-to)71-78
Number of pages8
JournalThin Solid Films
Volume307
Issue number1-2
DOIs
StatePublished - Oct 10 1997

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Keywords

  • Germane
  • Kinetic model
  • Photochemical vapor deposition
  • Silane

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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