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A kinetic model for metalorganic chemical vapor deposition from trimethylgallium and arsine
Meng Tao
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Contribution to journal
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Article
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peer-review
12
Scopus citations
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Dive into the research topics of 'A kinetic model for metalorganic chemical vapor deposition from trimethylgallium and arsine'. Together they form a unique fingerprint.
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Physics & Astronomy
metalorganic chemical vapor deposition
100%
kinetics
63%
gallium arsenides
58%
phosphides
24%
antisite defects
23%
carbon
23%
aluminum gallium arsenides
16%
chemical reactions
15%
vapor phases
14%
adsorption
13%
collisions
11%
physics
11%
temperature
5%