Abstract
A three-layer hierarchical approach for inventory control and production optimization of semiconductor reentrant manufacturing lines is developed. At the top layer, the parameters of an aggregated model are obtained on-line while, at the intermediate layer, production optimization and inventory control via model predictive control are performed. The aim of these two layers is aggregated (or averaged) supervisory control. The bottom layer consists of a distributed control policy which issues discrete-event decisions to track the aggregated targets issued by the optimizer. This layer accomplishes shop-floor control. The algorithm is applied to a discrete-event manufacturing line problem developed by Intel Corporation, which captures the main challenges posed by reentrant manufacturing lines.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 578-587 |
| Number of pages | 10 |
| Journal | IEEE Transactions on Control Systems Technology |
| Volume | 11 |
| Issue number | 4 |
| DOIs | |
| State | Published - Jul 2003 |
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Keywords
- Discrete-event system
- Hierarchical structure
- Model predictive control (MPC)
- Reentrant manufacturing line
- Scheduling
- Semiconductor fabrication
ASJC Scopus subject areas
- Control and Systems Engineering
- Electrical and Electronic Engineering
Cite this
A hierarchical approach to production control of reentrant semiconductor manufacturing lines. / Vargas-Villamil, Felipe D.; Rivera, Daniel; Kempf, Karl G.
In: IEEE Transactions on Control Systems Technology, Vol. 11, No. 4, 07.2003, p. 578-587.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - A hierarchical approach to production control of reentrant semiconductor manufacturing lines
AU - Vargas-Villamil, Felipe D.
AU - Rivera, Daniel
AU - Kempf, Karl G.
PY - 2003/7
Y1 - 2003/7
N2 - A three-layer hierarchical approach for inventory control and production optimization of semiconductor reentrant manufacturing lines is developed. At the top layer, the parameters of an aggregated model are obtained on-line while, at the intermediate layer, production optimization and inventory control via model predictive control are performed. The aim of these two layers is aggregated (or averaged) supervisory control. The bottom layer consists of a distributed control policy which issues discrete-event decisions to track the aggregated targets issued by the optimizer. This layer accomplishes shop-floor control. The algorithm is applied to a discrete-event manufacturing line problem developed by Intel Corporation, which captures the main challenges posed by reentrant manufacturing lines.
AB - A three-layer hierarchical approach for inventory control and production optimization of semiconductor reentrant manufacturing lines is developed. At the top layer, the parameters of an aggregated model are obtained on-line while, at the intermediate layer, production optimization and inventory control via model predictive control are performed. The aim of these two layers is aggregated (or averaged) supervisory control. The bottom layer consists of a distributed control policy which issues discrete-event decisions to track the aggregated targets issued by the optimizer. This layer accomplishes shop-floor control. The algorithm is applied to a discrete-event manufacturing line problem developed by Intel Corporation, which captures the main challenges posed by reentrant manufacturing lines.
KW - Discrete-event system
KW - Hierarchical structure
KW - Model predictive control (MPC)
KW - Reentrant manufacturing line
KW - Scheduling
KW - Semiconductor fabrication
UR - http://www.scopus.com/inward/record.url?scp=0038105030&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0038105030&partnerID=8YFLogxK
U2 - 10.1109/TCST.2003.813368
DO - 10.1109/TCST.2003.813368
M3 - Article
AN - SCOPUS:0038105030
VL - 11
SP - 578
EP - 587
JO - IEEE Transactions on Control Systems Technology
JF - IEEE Transactions on Control Systems Technology
SN - 1063-6536
IS - 4
ER -