A hierarchical approach to production control of reentrant semiconductor manufacturing lines

Felipe D. Vargas-Villamil; Daniel Rivera; Karl G. Kempf

doi:10.1109/TCST.2003.813368

A hierarchical approach to production control of reentrant semiconductor manufacturing lines

Felipe D. Vargas-Villamil, Daniel Rivera, Karl G. Kempf

IAFSE-SEMTE: Chemical Engineering

Research output: Contribution to journal › Article › peer-review

59 Scopus citations

Abstract

A three-layer hierarchical approach for inventory control and production optimization of semiconductor reentrant manufacturing lines is developed. At the top layer, the parameters of an aggregated model are obtained on-line while, at the intermediate layer, production optimization and inventory control via model predictive control are performed. The aim of these two layers is aggregated (or averaged) supervisory control. The bottom layer consists of a distributed control policy which issues discrete-event decisions to track the aggregated targets issued by the optimizer. This layer accomplishes shop-floor control. The algorithm is applied to a discrete-event manufacturing line problem developed by Intel Corporation, which captures the main challenges posed by reentrant manufacturing lines.

Original language	English (US)
Pages (from-to)	578-587
Number of pages	10
Journal	IEEE Transactions on Control Systems Technology
Volume	11
Issue number	4
DOIs	https://doi.org/10.1109/TCST.2003.813368
State	Published - Jul 1 2003

Keywords

Discrete-event system
Hierarchical structure
Model predictive control (MPC)
Reentrant manufacturing line
Scheduling
Semiconductor fabrication

ASJC Scopus subject areas

Control and Systems Engineering
Electrical and Electronic Engineering

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