A fundamental feature scale model for low pressure deposition processes

Physics & Astronomy

• scale models 100%
• low pressure 72%
• tungsten 55%
• free molecular flow 33%
• mouth 28%
• profiles 23%
• differential equations 17%
• vapor deposition 16%
• evaluation 13%
• scanning 13%
• hydrogen 13%
• coefficients 11%
• electrons 9%

Chemical Compounds

• Deposition Process 94%
• Tungsten 79%
• Pressure 50%
• Low Pressure Chemical Vapour Deposition 42%
• Shape 18%
• Flow 18%
• Electron Particle 15%
• Hydrogen 14%
• Liquid Film 14%
• Reduction 13%
• Time 10%

Engineering & Materials Science

• Tungsten 93%
• Low pressure chemical vapor deposition 47%
• Integrodifferential equations 41%
• Deposition rates 37%
• Electrons 29%
• Hydrogen 23%
• Scanning 22%