A free electron laser-photoemission electron microscope system (FEL-PEEM)

H. Ade, W. Yang, S. L. English, J. Hartman, R. F. Davis, Robert Nemanich, V. N. Litvinenko, I. V. Pinayev, Y. Wu, J. M J Madey, V. N. Litvinenko, I. V. Pinayev, Y. Wu, J. M J Madey

Research output: Contribution to journalArticle

58 Citations (Scopus)

Abstract

We report first results from our effort to couple a high resolution photoemission electron microscope (PEEM) to the OK-4 ultraviolet free electron laser at Duke University (OK-4/Duke UV FEL). The OK-4/Duke UV PEL is a high intensity source of tunable monochromatic photons in the 3-10 eV energy range. This tunability is unique and allows us to operate near the photoemission threshold of any samples and thus maximize sample contrast while keeping chromatic aberrations in the PEEM minimal. We have recorded first Images from a variety of samples using spontaneous radiation from the OK-4/Duke UV PEL in the photon energy range of 4.0-6.5 eV. Due to different photothreshold emission from different sample areas, emission from these areas could be turned on (or off) selectively. We have also observed relative intensity reversal with changes in photon energy which are interpreted as density-of-state contrast. Usable image quality has been achieved, even though the output power of the FEL in spontaneous emission mode was several orders of magnitude lower than the anticipated full laser power. The PEEM has achieved a spatial resolution of 12 nm.

Original languageEnglish (US)
Pages (from-to)1257-1268
Number of pages12
JournalSurface Review and Letters
Volume5
Issue number6
StatePublished - 1998
Externally publishedYes

Fingerprint

Free electron lasers
Photoemission
free electron lasers
Electron microscopes
photoelectric emission
electron microscopes
Photons
photons
Ultraviolet lasers
Spontaneous emission
Laser modes
ultraviolet lasers
Aberrations
Image quality
spontaneous emission
energy
aberration
spatial resolution
Radiation
thresholds

ASJC Scopus subject areas

  • Materials Science(all)
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics
  • Surfaces and Interfaces

Cite this

Ade, H., Yang, W., English, S. L., Hartman, J., Davis, R. F., Nemanich, R., ... Madey, J. M. J. (1998). A free electron laser-photoemission electron microscope system (FEL-PEEM). Surface Review and Letters, 5(6), 1257-1268.

A free electron laser-photoemission electron microscope system (FEL-PEEM). / Ade, H.; Yang, W.; English, S. L.; Hartman, J.; Davis, R. F.; Nemanich, Robert; Litvinenko, V. N.; Pinayev, I. V.; Wu, Y.; Madey, J. M J; Litvinenko, V. N.; Pinayev, I. V.; Wu, Y.; Madey, J. M J.

In: Surface Review and Letters, Vol. 5, No. 6, 1998, p. 1257-1268.

Research output: Contribution to journalArticle

Ade, H, Yang, W, English, SL, Hartman, J, Davis, RF, Nemanich, R, Litvinenko, VN, Pinayev, IV, Wu, Y, Madey, JMJ, Litvinenko, VN, Pinayev, IV, Wu, Y & Madey, JMJ 1998, 'A free electron laser-photoemission electron microscope system (FEL-PEEM)', Surface Review and Letters, vol. 5, no. 6, pp. 1257-1268.
Ade H, Yang W, English SL, Hartman J, Davis RF, Nemanich R et al. A free electron laser-photoemission electron microscope system (FEL-PEEM). Surface Review and Letters. 1998;5(6):1257-1268.
Ade, H. ; Yang, W. ; English, S. L. ; Hartman, J. ; Davis, R. F. ; Nemanich, Robert ; Litvinenko, V. N. ; Pinayev, I. V. ; Wu, Y. ; Madey, J. M J ; Litvinenko, V. N. ; Pinayev, I. V. ; Wu, Y. ; Madey, J. M J. / A free electron laser-photoemission electron microscope system (FEL-PEEM). In: Surface Review and Letters. 1998 ; Vol. 5, No. 6. pp. 1257-1268.
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