A correlation of the average sample mass and the sputtering yield in SIMS

William Katz, Peter Williams, C. A. Evans

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. Examining several homologous series of compounds, we have determined a linear correlation between sputtering yield and average substrate mass. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

Original languageEnglish (US)
Pages (from-to)120-121
Number of pages2
JournalSurface and Interface Analysis
Volume2
Issue number3
DOIs
StatePublished - Jun 1980
Externally publishedYes

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ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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