A correlation of the average sample mass and the sputtering yield in SIMS

William Katz; Peter Williams; C. A. Evans

doi:10.1002/sia.740020308

A correlation of the average sample mass and the sputtering yield in SIMS

William Katz, Peter Williams, C. A. Evans

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. Examining several homologous series of compounds, we have determined a linear correlation between sputtering yield and average substrate mass. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

Original language	English (US)
Pages (from-to)	120-121
Number of pages	2
Journal	Surface and Interface Analysis
Volume	2
Issue number	3
DOIs	https://doi.org/10.1002/sia.740020308
State	Published - Jun 1980
Externally published	Yes

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1002/sia.740020308

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@article{278b0b560d954392b1b7ef0684d10394,

title = "A correlation of the average sample mass and the sputtering yield in SIMS",

abstract = "Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. Examining several homologous series of compounds, we have determined a linear correlation between sputtering yield and average substrate mass. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.",

author = "William Katz and Peter Williams and Evans, {C. A.}",

year = "1980",

month = jun,

doi = "10.1002/sia.740020308",

language = "English (US)",

volume = "2",

pages = "120--121",

journal = "Surface and Interface Analysis",

issn = "0142-2421",

publisher = "John Wiley and Sons Ltd",

number = "3",

}

TY - JOUR

T1 - A correlation of the average sample mass and the sputtering yield in SIMS

AU - Katz, William

AU - Williams, Peter

AU - Evans, C. A.

PY - 1980/6

Y1 - 1980/6

N2 - Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. Examining several homologous series of compounds, we have determined a linear correlation between sputtering yield and average substrate mass. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

AB - Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. Examining several homologous series of compounds, we have determined a linear correlation between sputtering yield and average substrate mass. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.

UR - http://www.scopus.com/inward/record.url?scp=0019025791&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0019025791&partnerID=8YFLogxK

U2 - 10.1002/sia.740020308

DO - 10.1002/sia.740020308

M3 - Article

AN - SCOPUS:0019025791

SN - 0142-2421

VL - 2

SP - 120

EP - 121

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

IS - 3

ER -

A correlation of the average sample mass and the sputtering yield in SIMS

Abstract

ASJC Scopus subject areas

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