100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy

Li Wen-Di Li, Chao Wang, Stephen Y. Chou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A wafer-scale (~4 inch) 100 nm nano-checkerboard structure was fabricated. The fabrication combines multiple nanoimprint lithography, 3-D patterning and self-aligned etching. Transmission/reflection resonance at ~750 nm and Raman enhancement of ~ 4.5x106 were achieved.

Original languageEnglish (US)
Title of host publicationOptics InfoBase Conference Papers
StatePublished - 2010
Externally publishedYes
EventConference on Lasers and Electro-Optics, CLEO 2010 - San Jose, CA, United States
Duration: May 16 2010May 21 2010

Other

OtherConference on Lasers and Electro-Optics, CLEO 2010
CountryUnited States
CitySan Jose, CA
Period5/16/105/21/10

Fingerprint

Nanoimprint lithography
Raman spectroscopy
Etching
lithography
etching
wafers
Fabrication
fabrication
augmentation

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy. / Wen-Di Li, Li; Wang, Chao; Chou, Stephen Y.

Optics InfoBase Conference Papers. 2010.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Wen-Di Li, L, Wang, C & Chou, SY 2010, 100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy. in Optics InfoBase Conference Papers. Conference on Lasers and Electro-Optics, CLEO 2010, San Jose, CA, United States, 5/16/10.
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