100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy

Wen Di Li, Chao Wang, Stephen Y. Chou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A wafer-scale (∼4 inch) 100 nm nano-checkerboard structure was fabricated. The fabrication combines multiple nanoimprint lithography, 3-D patterning and self-aligned etching. Transmission/reflection resonance at ∼750 nm and Raman enhancement of ∼ 4.5∼106 were achieved.

Original languageEnglish (US)
Title of host publicationLasers and Electro-Optics/Quantum Electronics and Laser Science Conference
Subtitle of host publication2010 Laser Science to Photonic Applications, CLEO/QELS 2010
PublisherAssociation for Computing Machinery
ISBN (Print)9781557528902
DOIs
StatePublished - 2010
Externally publishedYes

Publication series

NameLasers and Electro-Optics/Quantum Electronics and Laser Science Conference: 2010 Laser Science to Photonic Applications, CLEO/QELS 2010

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Radiation

Fingerprint

Dive into the research topics of '100 nm metallic checkerboard by wafer-scale nanoimprint and its application in surface enhanced Raman spectroscopy'. Together they form a unique fingerprint.

Cite this