Germyl Silanes: Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silico

Project: Research project

StatusFinished
Effective start/end date1/1/063/31/11

Funding

  • NSF: Directorate for Engineering (ENG): $220,592.00