Germyl Silanes: Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silico

Project: Research project

Project Details

Description

Germyl Silanes: Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silico Cermyl Silanes: Enabling Precursors for Chemical Vapor Deposition of Advanced CMOS Substrates, CMOS-Integrated MEMS, and Nano-Scale Quantum-Dot Silico
StatusFinished
Effective start/end date1/1/063/31/11

Funding

  • NSF: Directorate for Engineering (ENG): $220,592.00

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