Project Details
Description
DEFECT CONTROL IN PROCESSING OF OXYGEN IMPLANTED SILICON-ON-
| Status | Finished |
|---|---|
| Effective start/end date | 7/15/89 → 2/28/91 |
Funding
- DOC: National Institute of Standards and Technology (NIST): $40,000.00
Fingerprint
Explore the research topics touched on by this project. These labels are generated based on the underlying awards/grants. Together they form a unique fingerprint.