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Research Output 1900 2019

Equipment and Supplies
1999

Novel nanoscale resist using 10-undecanoic acid monolayers on silicon dioxide

Kozicki, M., Yang, S. J., Kim, T. & Kardynal, B., Jun 1999, In : Microelectronic Engineering. 47, 1, p. 239-241 3 p.

Research output: Contribution to journalArticle

Silicon Dioxide
Oxides
Electron beams
Monolayers
Silica

Transport in split gate MOS quantum dot structures

Goodnick, S., Bird, J., Ferry, D. K., Gunther, A. D., Khoury, M. D., Kozicki, M., Rack, M. J., Thornton, T. & Vasileska, D., 1999, Proceedings of the IEEE Great Lakes Symposium on VLSI. Los Alamitos, CA, United States: IEEE, p. 394-396 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Semiconductor quantum dots
Electrons
Electron energy levels
Fabrication
1998
16 Citations (Scopus)
Etching
insulators
etching
Fabrication
Silicon

Application of chemically enhanced vapour etching in the fabrication on nanostructures

Kozicki, M., Kardynal, B., Yang, S. J., Kim, T., Sidorov, M. V. & Smith, D., 1998, In : Semiconductor Science and Technology. 13, 8 SUPPL. A

Research output: Contribution to journalArticle

Etching
Nanostructures
Vapors
etching
wire
14 Citations (Scopus)

Equivalent circuit modeling of the Ag|As0.24S0.36Ag0.40|Ag system prepared by photodissolution of Ag

West, W. C., Seradzki, K., Kardynol, B. & Kozicki, M., Sep 1998, In : Journal of the Electrochemical Society. 145, 9, p. 2971-2974 4 p.

Research output: Contribution to journalArticle

equivalent circuits
Equivalent circuits
Solid electrolytes
solid electrolytes
impedance
11 Citations (Scopus)

Programmable current mode Hebbian learning neural network using Programmable Metallization Cell

Swaroop, B., West, W. C., Martinez, G., Kozicki, M. & Akers, L. A., 1998, Proceedings - IEEE International Symposium on Circuits and Systems. Anon (ed.). IEEE, Vol. 3. p. 33-36 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Metallizing
Neural networks
Networks (circuits)
5 Citations (Scopus)

Structural characterization of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon

Lützen, J., Kamal, A. H. M., Kozicki, M., Ferry, D. K., Sidorov, M. V. & Smith, D., Sep 1998, In : Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16, 5, p. 2802-2805 4 p.

Research output: Contribution to journalArticle

Nanocrystalline silicon
silicon films
Amorphous silicon
amorphous silicon
grain size
9 Citations (Scopus)

Two-terminal nanocrystalline silicon memory device at room temperature

Kamal, A. H. M., Lutzen, J., Sanborn, B. A., Sidorov, M. V., Kozicki, M., Smith, D. & Ferry, D. K., Nov 1998, In : Semiconductor Science and Technology. 13, 11, p. 1328-1332 5 p.

Research output: Contribution to journalArticle

Nanocrystalline silicon
Data storage equipment
Charge trapping
Drain current
silicon
1997

Electrical characterization of Uromyces germ tubes grown on integrated circuit substrates

McNally, H. A., Kozicki, M., Roberson, R. & Whidden, T. K., May 1997, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 15, 3, p. 779-783 5 p.

Research output: Contribution to journalArticle

integrated circuits
Integrated circuits
Ions
tubes
Substrates
8 Citations (Scopus)

Nanoscale lithography of silicon dioxide using electron beam patterned carboxylic acids as localized etch initiators

Whidden, T. K., Yang, S. J., Jenkins-Gray, A., Pan, M. & Kozicki, M., Feb 1997, In : Journal of the Electrochemical Society. 144, 2, p. 605-616 12 p.

Research output: Contribution to journalArticle

initiators
Carboxylic Acids
Carboxylic acids
carboxylic acids
Silicon Dioxide
4 Citations (Scopus)

Ultrathin cobalt silicide layers formed by rapid thermal processing of metal on amorphous silicon

Kamal, A. H. M., Rack, M. J., Kozicki, M., Ferry, D. K., Lützen, J. & Hallmark, J. A., Jul 1997, In : Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15, 4, p. 899-902 4 p.

Research output: Contribution to journalArticle

Rapid thermal processing
Amorphous silicon
amorphous silicon
Cobalt
cobalt
1996
6 Citations (Scopus)

Nanolithography

Ferry, D. K., Khoury, M., Pivin, D. P., Connolly, K. M., Whidden, T. K., Kozicki, M. & Allee, D., Nov 1996, In : Semiconductor Science and Technology. 11, 11 SUPPL. S, p. 1552-1557 6 p.

Research output: Contribution to journalArticle

Nanolithography
Electron beam lithography
lithography
Scanning
electron beams
9 Citations (Scopus)

Nanoscale patterning of silicon dioxide thin films by catalyzed HF vapor etching

Allgair, J., Ryan, J. M., Song, H. J., Kozicki, M., Whidden, T. K. & Ferry, D. K., Dec 1996, In : Nanotechnology. 7, 4, p. 351-355 5 p.

Research output: Contribution to journalArticle

Silicon Dioxide
Etching
Vapors
Silica
etching
73 Citations (Scopus)

Pattern transfer to silicon by microcontact printing and RIE

Whidden, T. K., Ferry, D. K., Kozicki, M., Kim, E., Kumar, A., Wilbur, J. & Whitesides, G. M., Dec 1996, In : Nanotechnology. 7, 4, p. 447-451 5 p.

Research output: Contribution to journalArticle

Reactive ion etching
Silicon
printing
Printing
Masks

Programmable Metallization Cell

Kozicki, M., Jan 29 1996

Research output: Patent

Dendrites (metallography)
Metallizing
Data storage equipment
Metals
6 Citations (Scopus)

Self-assembled monolayer resists and nanoscale lithography of silicon dioxide thin films by chemically enhanced vapor etching (CEVE)

Pan, M., Yun, M., Kozicki, M. & Whidden, T. K., Oct 1996, In : Superlattices and Microstructures. 20, 3, p. 368-376 9 p.

Research output: Contribution to journalArticle

Self assembled monolayers
Silicon Dioxide
Lithography
Etching
lithography
3 Citations (Scopus)

The use of electron beam exposure and chemically enhanced vapor etching of SiO2 for nanoscale fabrication

Kozicki, M., Allgair, J., Jenkins-Gray, A., Ferry, D. K. & Whidden, T. K., Sep 1996, In : Physica B: Condensed Matter. 227, 1-4, p. 318-322 5 p.

Research output: Contribution to journalArticle

Electron beams
Etching
Vapors
etching
electron beams
1995
13 Citations (Scopus)

Catalyzed HF Vapor Etching of Silicon Dioxide for Micro- and Nanolithographic Masks

Whidden, T. K., Allgair, J., Ryan, J. M., Kozicki, M. & Ferry, D. K., 1995, In : Journal of the Electrochemical Society. 142, 4, p. 1199-1205 7 p.

Research output: Contribution to journalArticle

Silicon Dioxide
Masks
Electron beams
Etching
masks
2 Citations (Scopus)

Directed growth of Uromyces hyphae on integrated circuit substrates

Kozicki, M., Roberson, R. W., Whidden, T. K. & Kersey, S. E., 1995, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 13, 3, p. 1808-1813 6 p.

Research output: Contribution to journalArticle

integrated circuits
Integrated circuits
Networks (circuits)
Substrates
hybrid circuits
11 Citations (Scopus)

Nanoscale scanning tunneling microscope patterning of silicon dioxide thin films by catalyzed HF vapor etching

Whidden, T. K., Allgair, J., Jenkins-Gray, A. & Kozicki, M., May 1995, In : Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 13, 3, p. 1337-1341 5 p.

Research output: Contribution to journalArticle

Etching
Microscopes
Vapors
Silica
Scanning
1994
4 Citations (Scopus)

Application of feed-forward and adaptive feedback control to semiconductor device manufacturing

Stoddard, K., Crouch, P., Kozicki, M. & Tsakalis, K., 1994, Proceedings of the American Control Conference. American Automatic Control Council, Vol. 1. p. 892-896 5 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Semiconductor devices
Feedback control
Aluminum
Metallizing
Silicon wafers
1993
6 Citations (Scopus)

ExPro - an expert system based process management system

Rastogi, P., Kozicki, M. & Golshani, F., Aug 1993, In : IEEE Transactions on Semiconductor Manufacturing. 6, 3, p. 207-218 12 p.

Research output: Contribution to journalArticle

expert systems
management systems
Expert systems
Simulators
wafers
1991
20 Citations (Scopus)

Pass - a chalcogenide-based lithography scheme for I.C. fabrication

Kozicki, M., Hsia, S. W., Owen, A. E. & Ewen, P. J. S., 1991, In : Journal of Non-Crystalline Solids. 137-138, PART 2, p. 1341-1344 4 p.

Research output: Contribution to journalArticle

Silver
Lithography
lithography
Fabrication
fabrication
1 Citation (Scopus)

Some fundamental issues on metallization in VLSI (Invited Paper)

Ferry, D. K., Kozicki, M. & Raupp, G., 1991, Proceedings of SPIE - The International Society for Optical Engineering. Gildenblat, G. S. & Schwartz, G. P. (eds.). Bellingham, WA, United States: Publ by Int Soc for Optical Engineering, Vol. 1596. p. 2-11 10 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

very large scale integration
Metallizing
Metals
ULSI circuits
scaling
1989
4 Citations (Scopus)

As-S/Ag systems for integrated optics

Kozicki, M., Khawaja, Y., Owen, A. E., Ewen, P. J. S. & Zakery, A., 1989, Sixth Int VLSI Multilevel Interconnect Conf. Anon (ed.). Piscataway, NJ, United States: Publ by IEEE, p. 251-257 7 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Integrated optics
Photolithography
Metals
Thick films
Electron beams
2 Citations (Scopus)

Rapid thermal nitridation of thin SiO2 films

Henscheid, D., Kozicki, M., Sheets, G. W., Mughal, M., Zwiebel, I. & Graham, R. J., Mar 1989, In : Journal of Electronic Materials. 18, 2, p. 99-104 6 p.

Research output: Contribution to journalArticle

Nitridation
Thin films
MIS devices
thin films
Processing

Silicide/polysilicon layer formation using dynamic recoil mixing

Kozicki, M., Robertson, J. M., Kheyrandish, H. & Hill, A. E., Mar 1989, In : Journal of the Electrochemical Society. 136, 3, p. 873-875 3 p.

Research output: Contribution to journalArticle

Polysilicon
packing density
low resistance
shunts
high resistance
1 Citation (Scopus)

Silicide formation of polycrystalline silicon by direct metal implantation

Kozicki, M. & Robertson, J. M., Mar 1989, In : Journal of the Electrochemical Society. 136, 3, p. 878-881 4 p.

Research output: Contribution to journalArticle

Polysilicon
implantation
Metals
silicon
Ion implantation
1988
1 Citation (Scopus)

Effects of nonuniform oxide thickness on MOSFET performance.

Zhang, Q. Z., Kozicki, M. & Schroder, D. K., Aug 1988, In : IEEE Transactions on Electron Devices. 35, 8, p. 1395-1397 3 p.

Research output: Contribution to journalArticle

Oxides
field effect transistors
Electric fields
oxides
saturation

Formation and oxidation of implanted cobalt silicides on polycrystalline-silicon.

Kozicki, M., 1988, 1988 Proc Fifth Int IEEE VLSI Multilevel Interconnect Conf. Piscataway, NJ, United States: Publ by IEEE, p. 198-204 7 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Silicides
Polysilicon
Cobalt
Oxidation
Sheet resistance
1984
1 Citation (Scopus)

A low energy electron beam annealing system: Design, capability and use

Kozicki, M., Dinnis, A. R. & Robertson, J. M., 1984, In : Scanning. 6, 2, p. 3-7 5 p.

Research output: Contribution to journalArticle

systems engineering
Electron beams
Systems analysis
electron beams
Annealing
1983

COBALT POLYCIDE - GATE LEVEL MATERIAL FOR VLSI.

Kozicki, M., Robertson, J. M. & Holwill, R., 1983, IEE Colloquium (Digest). 1983 /90 ed. IEE

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Polysilicon
Cobalt
Transition metals
Chemical vapor deposition
Geometry
2 Citations (Scopus)

ELECTRON-BEAM ANNEALING OF Co AND Cr IMPLANTED POLYCRYSTALLINE SILICON.

Kozicki, M. & Robertson, J. M., 1983, Institute of Physics Conference Series. 67 ed. Bristol, Engl: Inst of Physics, p. 137-142 6 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

silicon
1900

BIO-HYBRID INTEGRATED SYSTEMS

Kozicki, M., Jan 1 1900

Research output: Patent

Integrated circuits
Cells
Molecular electronics
Electronic states
Chemical sensors

Carbon Enhanced Vapor Etching

Kozicki, M., Jan 1 1900

Research output: Patent

etching
carbon
swell
geometry
material
Integrated circuits
Etching
Vapors
Fabrication
Carbon
Vapors
Oxides
Photoresists
Etching
Integrated circuits
photoresists
arsenic
integrated circuits
sulfides
high resolution
Solar System
Sunscreening Agents
Skin Neoplasms
Ultraviolet Rays
Equipment and Supplies