Engineering & Materials Science
Flexible displays
100%
Thin film transistors
87%
Substrates
76%
Titanium
58%
Oxidation
50%
Oxygen
48%
Fabrication
47%
Deposition rates
47%
Display devices
44%
Nickel
43%
Silica
41%
Adsorption
39%
Temperature
39%
Plasmas
39%
Low pressure chemical vapor deposition
36%
Plastics
35%
Amorphous silicon
35%
Plasma enhanced chemical vapor deposition
35%
Catalysts
34%
Tungsten
29%
Reaction rates
28%
Polymers
28%
Radiation
28%
Methanation
24%
Atoms
24%
Polyimides
23%
Microwaves
23%
Flexible electronics
22%
Organic light emitting diodes (OLED)
22%
Cytotoxicity
22%
Aspect ratio
21%
Silicon
21%
Microelectronics
21%
Neuroglia
20%
Chemical vapor deposition
20%
Fluxes
20%
Trichloroethylene
20%
Oxides
20%
Indium
19%
Alumina
18%
Stainless steel
18%
Hydrogen
18%
Formic acid
18%
Metals
18%
Fibroblasts
17%
Fischer-Tropsch synthesis
17%
Metal foil
16%
Film thickness
15%
Desorption
15%
Etching
15%
Chemical Compounds
Photocatalytic Oxidation
46%
Liquid Film
43%
Low Pressure Chemical Vapour Deposition
35%
Silicon Dioxide
34%
Pressure
33%
Surface
29%
Tungsten
28%
Plasma Enhanced Chemical Vapour Deposition
27%
Amorphous Silicon
24%
Implant
22%
Intracortical
22%
Flow
21%
Microelectronics
19%
Adsorption
18%
Benzocyclobutene
18%
Catalyst
17%
Vacuum
15%
Chemical Vapour Deposition
15%
Foil
15%
Water Vapor
15%
Oxygen Atom
14%
Fischer-Tropsch Synthesis
14%
Desorption
14%
Reduction
13%
Dioxygen
13%
Microwave
13%
Oxide
13%
Amorphous Material
12%
Deposition Process
12%
Plasma
11%
Silane
11%
Simulation
11%
Hydrogen
11%
Air Purification
11%
Time
10%
Compound Mobility
10%
Phosphosilicate Glass
10%
Electron Cyclotron Resonance
9%
Chemical Passivation
9%
Oxidation Reaction
9%
Metal
8%
Dielectric Film
8%
Partial Pressure
8%
Polyimide Macromolecule
8%
Scaling Law
8%
Dimension
8%
Adhesive Bonding
8%
Polycrystalline Solid
8%
Byproduct
8%
Environment
8%
Physics & Astronomy
vapor deposition
44%
catalysts
31%
titanium
31%
manufacturing
30%
nickel
25%
silicon dioxide
23%
oxidation
22%
wafers
22%
low pressure
21%
oxygen atoms
21%
adsorption
21%
transistors
20%
plastics
18%
microwaves
17%
amorphous silicon
16%
tungsten
16%
microelectronics
16%
oxygen
16%
reactors
14%
adhesives
14%
profiles
14%
temperature
14%
electronics
13%
etching
13%
fabrication
13%
indium oxides
12%
oxygen plasma
11%
carbides
11%
zinc oxides
11%
thin films
11%
kinetics
10%
desorption
10%
methanation
10%
film thickness
9%
light emitting diodes
9%
matrices
9%
diodes
9%
air
9%
iron
9%
ballistics
8%
synthesis
8%
formic acid
8%
hydrogenation
8%
predictions
8%
reaction kinetics
8%
polyimides
8%
x ray detectors
8%
passivity
8%
xylene
7%
hydrogen
7%