The Goldwater Materials Science facility provides an extensive array of analytical tools and techniques for optical, structural and surface analysis; surface morphology, chemistry & microscopy; and synthesis & processing. Widely used techniques include X-ray Diffraction & Topography; Atomic Force Microscopy; FT-IR and Raman Spectroscopy; Auger and X-ray Photoelectron Spectroscopy; Optical & Stylus Profilometry; Residual Gas Analysis; Ellipsometry; and Thin film synthesis. Optical Spectroscopy Ellipsometer (VASE) FT-IR / FT-Raman (Bruker IFS66V/S) Micro-Raman Spectrometer UV-Vis Spectrometer (Perkin Elmer Lambda 18) Surface Composition & Film Deposition Auger Electron Spectroscopy (AES )X-ray Photoelectron Spectroscopy (VG 220i-XL) Film Deposition X-ray Diffraction High Resolution X-ray Diffractometer (PANalytical X'Pert PRO MRD) X-ray topography (Rigaku XRT-100) Powder X-ray Diffractometer (Siemens D5000) Surface Imaging Optical Profilometer (ZeScope) Stylus Profilometer (Bruker Dektak XT) Scanning Probe/ Atomic force Microscopy (SPM/AFM) Materials Processing & Calorimetry Calorimetry (TGA/DTA/DSC) Residual Gas Analysis (SRS200) Furnaces General Lab Contact: Emmanuel Soignard
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